Very often in micromachining and spectroscopy applications, one laser beam is not enough. When the space is limited or reflective and polarizing beam splitters are not appropriate, especially where ultra-short laser pulses are used, diffractive optics stand-in.
DOEs can be designed and carefully manufactured in a way that they can divide one laser beam into the desired number of diffraction orders with minimal losses and symmetrical fanning out configuration. The diffraction efficiencies can range from fractions of a percent for beam intensity sampling applications to nearly unity efficiencies when losses are undesirable.
| Main Characteristics |     |
|
|
|
||
 Optimized for the wavelength of your choice |
||
|
79% Diffraction efficiency (sum of +1 and -1diffraction orders for optimized wavelength) |
||
| Application | ||
 4f lens optical systems and similar |
||
| Reflective DOEs are employed in atomic trapping experiments. |
Fabrication technology
| Technics | Available | Aperture | Material |
|---|---|---|---|
| UV lithography | 4μm, 10μm, 10.8μm, 11.7μm, 13μm, 15μm, 17μm, 20μm, 40μm |
up to 20mm × 20mm | Fused silica, monocrystalline silicon |
| EBL lithography | period and filing factor of your choice <4μm | typical but not limited to 5mm × 5mm |
Fused silica (substrate up to 4“), monocrystalline silicon |
| Holographic lithography | 250 - 400 nm | typical but not limited to 10mm × 10mm |
Fused silica, monocrystalline silicon |
*Thin metal coating enhancing reflectance is available.
 |
You know what light distribution you need but are not sure how to obtain it. Just contact us! We will simulate and realize the custom pattern for your task. |
|
References
K. Jarašiūnas, R. Aleksiejūnas, T. Malinauskas, V. Gudelis, T. Tamulevičius, S. Tamulevičius, A. Guobienė, A. Usikov, V. Dmitriev, H. J. Gerritsen, Implementation of diffractive optical element in four-wave mixing scheme for ex-situ evaluation of HVPE-grown GaN layers // Review of Scientific Instruments 78 033901 (2007) https://doi.org/10.1063/1.2712788
T. Tamulevičius, I. Gražulevičiūtė, A. Jurkevičiūtė, S. Tamulevičius,The Calculation, Fabrication and Verification of Diffraction Grating Based on Laser Beam Splitters Employing a White Light Scatterometry Technique // Optics and Lasers in Engineering 51 (10) 1185-1191 (2013) https://doi.org/10.1016/j.optlaseng.2013.04.001
L. Stankevičius, T. Tamulevičius, A. Žutautas, M. Juodėnas, K. Juškevičius, R. Drazdys, S. Tamulevičius, Diffraction efficiency optimization of multilayer dielectric mirror-based gratings for 1030 nm femtosecond lasers // Optics and Laser Technology 126 106071, 1-8 (2020) https://doi.org/10.1016/j.optlastec.2020.106071
Žutautas, A.; Tamulevičius, S.; Tamulevičius, T. From design to realization of high diffraction efficiency Littrow configuration diffraction gratings based on multilayer dielectric mirrors patterned with electron beam lithography // Optics and laser technology 169 110086, 1-7 (2023) http://doi.org/10.1016/j.optlastec.2023.110086.
